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12th Annual Symposium on Photomask Technology and Management : proceedings : 23-24 September 1992, Sunnyvale, California / sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology. - Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1993. - ix, 286 p. : ill. ; 28 cm. - SPIE proceedings series ; v. 1809 . - Proceedings of SPIE--the International Society for Optical Engineering ; v. 1809. .

Includes bibliographical references and index.

ISBN: 0819410098 (pbk.) 9780819410092

LCCN: 92062651

Subjects--Topical Terms:
Integrated circuits--Masks--Congresses
Microlithography--Congresses
Electronics & communications engineering
Applied optics

Dewey Class. No.: 621.381531