MARC details
000 -LEADER |
fixed length control field |
01491cam a2200373 a 4500 |
001 - CONTROL NUMBER |
control field |
25620122 |
005 - DATE AND TIME OF LATEST TRANSACTION |
control field |
20201215151511.0 |
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION |
fixed length control field |
920304s1992 waua b 101 0 eng |
010 ## - LIBRARY OF CONGRESS CONTROL NUMBER |
LC control number |
91068116 |
020 ## - INTERNATIONAL STANDARD BOOK NUMBER |
International Standard Book Number |
081940733X (pbk.) |
020 ## - INTERNATIONAL STANDARD BOOK NUMBER |
International Standard Book Number |
9780819407337 |
040 ## - CATALOGING SOURCE |
Original cataloging agency |
DLC |
Transcribing agency |
DLC |
Modifying agency |
OCL |
049 ## - LOCAL HOLDINGS (OCLC) |
Holding library |
TIZA |
Local codes |
30384 |
072 #7 - SUBJECT CATEGORY CODE |
Subject category code |
TTB |
Source |
thema |
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER |
Classification number |
621.3815 |
111 2# - MAIN ENTRY--MEETING NAME |
Meeting name or jurisdiction name as entry element |
Symposium on Photomask Technology |
Number of part/section/meeting |
(11th : |
Date of meeting |
1991 : |
Location of meeting |
Sunnyvale, Calif.) |
9 (RLIN) |
50051 |
245 10 - TITLE STATEMENT |
Title |
11th annual Symposium on Photomask Technology : |
Remainder of title |
proceedings : September 25-27, 1991, Sunnyvale, California / |
Statement of responsibility, etc. |
sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology. |
260 ## - PUBLICATION, DISTRIBUTION, ETC. |
Place of publication, distribution, etc. |
Bellingham, Wash. : |
Name of publisher, distributor, etc. |
SPIE--the International Society for Optical Engineering, |
Date of publication, distribution, etc. |
c1992. |
300 ## - PHYSICAL DESCRIPTION |
Extent |
vii, 348 p. : |
Other physical details |
ill. ; |
Dimensions |
28 cm. |
490 1# - SERIES STATEMENT |
Series statement |
SPIE proceedings series ; |
Volume/sequential designation |
v. 1604 |
504 ## - BIBLIOGRAPHY, ETC. NOTE |
Bibliography, etc. note |
Includes bibliographical references and index. |
590 ## - LOCAL NOTE (RLIN) |
a |
0.00 |
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM |
Topical term or geographic name entry element |
Integrated circuits |
General subdivision |
Masks |
Form subdivision |
Congresses |
9 (RLIN) |
50052 |
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM |
Topical term or geographic name entry element |
Microlithography |
Form subdivision |
Congresses |
9 (RLIN) |
50053 |
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM |
Topical term or geographic name entry element |
Applied optics |
Source of heading or term |
thema |
9 (RLIN) |
31387 |
710 2# - ADDED ENTRY--CORPORATE NAME |
Corporate name or jurisdiction name as entry element |
BACUS (Technical group) |
9 (RLIN) |
24978 |
740 0# - ADDED ENTRY--UNCONTROLLED RELATED/ANALYTICAL TITLE |
Uncontrolled related/analytical title |
Eleventh annual Symposium on Photomask Technology. |
830 #0 - SERIES ADDED ENTRY--UNIFORM TITLE |
Uniform title |
Proceedings of SPIE--the International Society for Optical Engineering ; |
Volume/sequential designation |
v. 1604. |
9 (RLIN) |
10479 |
902 ## - LOCAL DATA ELEMENT B, LDB (RLIN) |
a |
150908 |
903 ## - LOCAL DATA ELEMENT C, LDC (RLIN) |
a |
MARS |
907 ## - LOCAL DATA ELEMENT G, LDG (RLIN) |
a |
.b10099025 |
b |
cstor |
c |
- |
942 ## - ADDED ENTRY ELEMENTS (KOHA) |
Suppress in OPAC |
0 |
998 ## - LOCAL CONTROL INFORMATION (RLIN) |
Operator's initials, OID (RLIN) |
1 |
Cataloger's initials, CIN (RLIN) |
010425 |
First Date, FD (RLIN) |
m |
Local |
a |
-- |
- |
-- |
0 |