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| 008 | 001128s2001 waua b 001 0 eng d | ||
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| 050 | 0 | _b.L397 2001 | |
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| 082 | _a621.381531 | ||
| 100 | 1 |
_aLevinson, Harry J. _927079 |
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| 245 | 1 | 0 |
_aPrinciples of lithography / _cHarry J. Levinson. |
| 260 |
_aBellingham, Wash., USA : _bSPIE Press, _cc2001. |
||
| 300 |
_ax, 373 p. : _bill. ; _c26 cm. |
||
| 504 | _aIncludes bibliographical references and index. | ||
| 505 | 0 | _aOverview of lithography -- Optical pattern formation -- Photoresists -- Modeling and thin film effects -- Wafer steppers -- Overlay -- Masks and reticles -- Overcoming the diffraction limit -- Metrology -- The limits of optical lithography -- Lithography costs -- Alternative lithography techniques. | |
| 590 | _a99.18 | ||
| 650 | 0 |
_aIntegrated circuits _xDesign and construction _94737 |
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| 650 | 0 |
_aMicrolithography. _95633 |
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| 650 | 7 |
_aMedia, entertainment, information & communication industries _2thema _966357 |
|
| 650 | 7 |
_aElectronics: circuits & components _2thema _966358 |
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| 650 | 7 |
_aApplied optics _2thema _931387 |
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