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Handbook of thin-film deposition processes and techniques : principles, methods, equipment, and applications /

Handbook of thin-film deposition processes and techniques : principles, methods, equipment, and applications / edited by Klaus K. Schuegraf. - Park Ridge, N.J., U.S.A. : Noyes Publications, c1988. - xvii, 413 p. : ill. ; 25 cm.

Includes bibliographies and index.

Deposition technologies and applications : introduction and overview / Werner Kern and Klaus K. Schuegraf -- Silicon epitaxy by chemical vapor deposition / Martin L. Hammond -- Low pressure chemical vapor deposition / Ronald C. Rossi -- Plasma-assisted chemical vapor deposition / V.S. Nguyen -- Microwave electron cyclotron resonance plasma chemical vapor deposition / Seitaro Matsuo -- Molecular beam epitaxy : equipment and practice / Walter S. Knodle and Robert Chow -- Metal-organic chemical vapor deposition : technology and equipment / J.L. Zilko -- Photochemical vapor deposition / Russell L. Abber -- Introduction to sputtering / Brian Chapman and Stefano Mangano -- Laser and electron beam assisted processing / Cameron A. Moore ... [et al.]. Ionized cluster beam deposition / Isao Yamada, Toshinori Takagi, and Peter Younger -- Ion beam deposition / John R. McNeil, James J. McNally and Paul D. Reader -- Plasma and elevated pressure oxidation in very large scale integration and ultra large scale integration / Arnold Reisman.

0815511531 : $82.00 9780815511533 : $82.00

87034702


Thin film devices--Design and construction--Handbooks, manuals, etc
Electronics: circuits & components

621.38152

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