MARC details
000 -LEADER |
fixed length control field |
02208cam a2200349 a 4500 |
001 - CONTROL NUMBER |
control field |
17234252 |
005 - DATE AND TIME OF LATEST TRANSACTION |
control field |
20201215151437.0 |
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION |
fixed length control field |
871125s1988 njua bf 001 0 eng |
010 ## - LIBRARY OF CONGRESS CONTROL NUMBER |
LC control number |
87034702 |
020 ## - INTERNATIONAL STANDARD BOOK NUMBER |
International Standard Book Number |
0815511531 : |
Terms of availability |
$82.00 |
020 ## - INTERNATIONAL STANDARD BOOK NUMBER |
International Standard Book Number |
9780815511533 : |
Terms of availability |
$82.00 |
040 ## - CATALOGING SOURCE |
Original cataloging agency |
DLC |
Transcribing agency |
DLC |
Modifying agency |
PMC |
-- |
OCL |
049 ## - LOCAL HOLDINGS (OCLC) |
Holding library |
TIZA |
Local codes |
29748 |
072 #7 - SUBJECT CATEGORY CODE |
Subject category code |
TJFC |
Source |
thema |
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER |
Classification number |
621.38152 |
245 00 - TITLE STATEMENT |
Title |
Handbook of thin-film deposition processes and techniques : |
Remainder of title |
principles, methods, equipment, and applications / |
Statement of responsibility, etc. |
edited by Klaus K. Schuegraf. |
260 ## - PUBLICATION, DISTRIBUTION, ETC. |
Place of publication, distribution, etc. |
Park Ridge, N.J., U.S.A. : |
Name of publisher, distributor, etc. |
Noyes Publications, |
Date of publication, distribution, etc. |
c1988. |
300 ## - PHYSICAL DESCRIPTION |
Extent |
xvii, 413 p. : |
Other physical details |
ill. ; |
Dimensions |
25 cm. |
504 ## - BIBLIOGRAPHY, ETC. NOTE |
Bibliography, etc. note |
Includes bibliographies and index. |
505 2# - FORMATTED CONTENTS NOTE |
Formatted contents note |
Deposition technologies and applications : introduction and overview / Werner Kern and Klaus K. Schuegraf -- Silicon epitaxy by chemical vapor deposition / Martin L. Hammond -- Low pressure chemical vapor deposition / Ronald C. Rossi -- Plasma-assisted chemical vapor deposition / V.S. Nguyen -- Microwave electron cyclotron resonance plasma chemical vapor deposition / Seitaro Matsuo -- Molecular beam epitaxy : equipment and practice / Walter S. Knodle and Robert Chow -- Metal-organic chemical vapor deposition : technology and equipment / J.L. Zilko -- Photochemical vapor deposition / Russell L. Abber -- Introduction to sputtering / Brian Chapman and Stefano Mangano -- Laser and electron beam assisted processing / Cameron A. Moore ... [et al.]. |
505 2# - FORMATTED CONTENTS NOTE |
Formatted contents note |
Ionized cluster beam deposition / Isao Yamada, Toshinori Takagi, and Peter Younger -- Ion beam deposition / John R. McNeil, James J. McNally and Paul D. Reader -- Plasma and elevated pressure oxidation in very large scale integration and ultra large scale integration / Arnold Reisman. |
590 ## - LOCAL NOTE (RLIN) |
a |
71.00 |
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM |
Topical term or geographic name entry element |
Thin film devices |
General subdivision |
Design and construction |
Form subdivision |
Handbooks, manuals, etc |
9 (RLIN) |
49330 |
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM |
Topical term or geographic name entry element |
Electronics: circuits & components |
Source of heading or term |
thema |
9 (RLIN) |
49331 |
700 1# - ADDED ENTRY--PERSONAL NAME |
Personal name |
Schuegraf, Klaus K. |
9 (RLIN) |
22554 |
740 01 - ADDED ENTRY--UNCONTROLLED RELATED/ANALYTICAL TITLE |
Uncontrolled related/analytical title |
Hand book of thin-film deposition processes and techniques. |
902 ## - LOCAL DATA ELEMENT B, LDB (RLIN) |
a |
140901 |
903 ## - LOCAL DATA ELEMENT C, LDC (RLIN) |
a |
MARS |
907 ## - LOCAL DATA ELEMENT G, LDG (RLIN) |
a |
.b10096401 |
b |
cgen |
c |
- |
942 ## - ADDED ENTRY ELEMENTS (KOHA) |
Suppress in OPAC |
0 |
998 ## - LOCAL CONTROL INFORMATION (RLIN) |
Operator's initials, OID (RLIN) |
1 |
Cataloger's initials, CIN (RLIN) |
010425 |
First Date, FD (RLIN) |
m |
Local |
a |
-- |
- |
-- |
0 |