Submicrometer metallization : the challenges, opportunities, and limitations : 23-25 September 1992, San Jose, California /
Submicrometer metallization : the challenges, opportunities, and limitations : 23-25 September 1992, San Jose, California /
Thomas Kwok, Takamaro Kikkawa, Krishna Shenai, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Bellingham, Wash. : SPIE, c1993.
- ix, 344 p. : ill. ; 28 cm.
- Proceedings / SPIE--the International Society for Optical Engineering ; v. 1805 .
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 1805. .
Includes bibliographical references and index.
0819410039 9780819410030
92062654
Integrated circuits--Design and construction--Congresses
Metallic films--Congresses
Metallizing--Congresses
Electrodiffusion--Congresses
Semiconductor-metal boundaries--Congresses
621.38152
Includes bibliographical references and index.
0819410039 9780819410030
92062654
Integrated circuits--Design and construction--Congresses
Metallic films--Congresses
Metallizing--Congresses
Electrodiffusion--Congresses
Semiconductor-metal boundaries--Congresses
621.38152