Handbook of thin-film deposition processes and techniques : principles, methods, equipment, and applications / edited by Klaus K. Schuegraf.
Material type:
TextPublication details: Park Ridge, N.J., U.S.A. : Noyes Publications, c1988.Description: xvii, 413 p. : ill. ; 25 cmISBN: - 0815511531 :
- 9780815511533 :
- 621.38152
| Item type | Current library | Call number | Copy number | Status | Date due | Barcode |
|---|---|---|---|---|---|---|
| General Lending | Carlow Campus Library General Lending | 621.38152 (Browse shelf(Opens below)) | 1 | Checked out | 27/07/2004 | 29748 |
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| 621.38152 Electronics. | 621.38152 Electronics. | 621.38152 Introduction to solid state devices / | 621.38152 Handbook of thin-film deposition processes and techniques : principles, methods, equipment, and applications / | 621.38152 Transistor and diode data book for design engineers. | 621.38152 Power electronics / | 621.38152 Semiconductor devices : basic principles / |
Includes bibliographies and index.
Deposition technologies and applications : introduction and overview / Werner Kern and Klaus K. Schuegraf -- Silicon epitaxy by chemical vapor deposition / Martin L. Hammond -- Low pressure chemical vapor deposition / Ronald C. Rossi -- Plasma-assisted chemical vapor deposition / V.S. Nguyen -- Microwave electron cyclotron resonance plasma chemical vapor deposition / Seitaro Matsuo -- Molecular beam epitaxy : equipment and practice / Walter S. Knodle and Robert Chow -- Metal-organic chemical vapor deposition : technology and equipment / J.L. Zilko -- Photochemical vapor deposition / Russell L. Abber -- Introduction to sputtering / Brian Chapman and Stefano Mangano -- Laser and electron beam assisted processing / Cameron A. Moore ... [et al.].
Ionized cluster beam deposition / Isao Yamada, Toshinori Takagi, and Peter Younger -- Ion beam deposition / John R. McNeil, James J. McNally and Paul D. Reader -- Plasma and elevated pressure oxidation in very large scale integration and ultra large scale integration / Arnold Reisman.
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